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Dimensional metrology for partially etched photomasks in iterative-etch fabrication processes

A journal article published by SPIE-Intl Soc Optical Eng on 1992-08-01 about metrology applied to partially etched photomasks and iterative etch fabrication methods. The supplied source metadata gives no further details of methods, results, or impacts.

Categories: science-and-space, technology

Generated scores

Scores are based on the cited reporting and use a 1–10 scale. Read the methodology.

Confidence
6/10
Geographic reach
2/10
Global importance
2/10
Impact magnitude
2/10
Positivity
6/10
Urgency
1/10

Why it matters

The article concerns measurement methods for photomask fabrication, which is relevant to semiconductor manufacturing metrology.

Sources

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