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Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node

A 2011 SPIE journal article concerning extreme-ultraviolet secondary electron blur at a 22-nanometer lithography node. The supplied excerpt only lists the publisher and content type and provides no additional event details.

Categories: science-and-space, technology

Generated scores

Scores are based on the cited reporting and use a 1–10 scale. Read the methodology.

Confidence
2/10
Geographic reach
1/10
Global importance
2/10
Impact magnitude
2/10
Positivity
5/10
Urgency
1/10

Why it matters

The item documents a technical study relevant to extreme-ultraviolet lithography at the 22-nm node.

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