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Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node
A 2011 SPIE journal article concerning extreme-ultraviolet secondary electron blur at a 22-nanometer lithography node. The supplied excerpt only lists the publisher and content type and provides no additional event details.
Categories: science-and-space, technology
Generated scores
Scores are based on the cited reporting and use a 1–10 scale. Read the methodology.
- Confidence
- 2/10
- Geographic reach
- 1/10
- Global importance
- 2/10
- Impact magnitude
- 2/10
- Positivity
- 5/10
- Urgency
- 1/10
Why it matters
The item documents a technical study relevant to extreme-ultraviolet lithography at the 22-nm node.

