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Fabrication and characterization of integrated three-dimensional linear taper on silicon-on-insulator

Journal article published by SPIE describing fabrication and characterization of an integrated three-dimensional linear taper on silicon-on-insulator. The excerpt lists the publisher and content type but provides no additional event details.

Sketch of the cross-section of a rectangular waveguide (450 nm x 220 nm). The waveguide consists of a silicon core (dark gray) on top of a silicon-dioxide layer (light-gray). Marcatili's method is sketched. The four outer quadrants are neglected. The standing waves in the core of the waveguide are sketched (blue and purple curves) and the exponentially decaying waves outside the waveguide are also sketched (blue and purple curves). The refractive index n of each of the regions is indicated.
Illustrative image: Sketch of the cross-section of a rectangular waveguide (450 nm x 220 nm). The waveguide consists of a silicon core (dark gray) on top of a silicon-dioxide layer (light-gray). Marcatili's method is sketched. The four outer quadrants are neglected. The standing waves in the core of the waveguide are sketched (blue and purple curves) and the exponentially decaying waves outside the waveguide are also sketched (blue and purple curves). The refractive index n of each of the regions is indicated. — Wouter Westerveld/Wikimedia Commons, CC BY-SA 4.0

Categories: technology, science-and-space

Generated scores

Scores are based on the cited reporting and use a 1–10 scale. Read the methodology.

Confidence
5/10
Geographic reach
1/10
Global importance
3/10
Impact magnitude
2/10
Positivity
6/10
Urgency
1/10

Why it matters

The paper reports a fabrication and characterization result relevant to silicon-on-insulator integrated component development.

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