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Fabrication of resonator–quantum well infrared photodetector focal plane array by inductively coupled plasma etching

Journal article (SPIE-Intl Soc Optical Eng) reporting fabrication of a resonator–quantum well infrared photodetector focal plane array using inductively coupled plasma etching. Published 2016-02-19.

SEM picture of Inductively Coupled Plasma - Deep Reactive Ion Etching (ICP-DRIE) in silicon. The picture depicts a test structure that was used to test several process parameters.
Illustrative image: SEM picture of Inductively Coupled Plasma - Deep Reactive Ion Etching (ICP-DRIE) in silicon. The picture depicts a test structure that was used to test several process parameters. — Mgerlt/Wikimedia Commons, CC BY 4.0

Categories: science-and-space, technology

Generated scores

Scores are based on the cited reporting and use a 1–10 scale. Read the methodology.

Confidence
6/10
Geographic reach
1/10
Global importance
3/10
Impact magnitude
3/10
Positivity
7/10
Urgency
1/10

Why it matters

Describes a fabrication method for an infrared photodetector focal plane array relevant to sensor technology research.

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