First published 10/2/2026, 5:58:15 PM · Last updated 10/2/2026, 5:58:15 PM

Micrograting fabricated by deep x-ray lithography for optical communications

A SPIE journal article describing fabrication of a micrograting using deep x-ray lithography aimed at optical communications. The supplied source data includes only the bibliographic record and no experimental or impact details.

Illustrative image: عناصر مورد استفاده در لیتوگرافی با اشعه ایکس — Elsevier B.V. Abrar Faisal, Thomas Beckenbach, Jürgen Mohr, and Pascal Meyer/Wikimedia Commons, CC BY-SA 4.0

Categories: science-and-space, technology

Generated scores

Scores are based on the cited reporting and use a 1–10 scale. Read the methodology.

Confidence: 4/10How certain the assessment is based on the clarity and evidence in the cited reporting.
Geographic reach: 1/10How widely the event reaches, from a local area (1) to worldwide impact (10).
Global importance: 3/10The event's broader significance, from limited importance (1) to major global importance (10).
Impact magnitude: 3/10The scale or severity of the real-world impact, from minor (1) to extreme (10).
Positivity: 7/10How harmful or beneficial the event is, from strongly harmful (1) to strongly positive (10).
Urgency: 1/10How time-sensitive the event is, from low urgency (1) to immediate attention needed (10).

Why it matters

The article documents a fabrication technique relevant to optical communications research and development.

Sources

Micrograting fabricated by deep x-ray lithography for optical communications

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