First published · Last updated
Modeling spray/puddle dissolution processes for deep-ultraviolet acid-hardened resists
SPIE published a journal article on 1993-10-01 presenting modeling of spray and puddle dissolution processes for deep-ultraviolet acid-hardened photoresists. The supplied excerpt contains only bibliographic metadata and the article topic.
Categories: science-and-space, technology
Generated scores
Scores are based on the cited reporting and use a 1–10 scale. Read the methodology.
- Confidence
- 5/10
- Geographic reach
- 1/10
- Global importance
- 2/10
- Impact magnitude
- 1/10
- Positivity
- 5/10
- Urgency
- 1/10
Why it matters
The article documents modeling work on dissolution processes relevant to deep-ultraviolet acid-hardened resists.

