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Modeling spray/puddle dissolution processes for deep-ultraviolet acid-hardened resists

SPIE published a journal article on 1993-10-01 presenting modeling of spray and puddle dissolution processes for deep-ultraviolet acid-hardened photoresists. The supplied excerpt contains only bibliographic metadata and the article topic.

Categories: science-and-space, technology

Generated scores

Scores are based on the cited reporting and use a 1–10 scale. Read the methodology.

Confidence
5/10
Geographic reach
1/10
Global importance
2/10
Impact magnitude
1/10
Positivity
5/10
Urgency
1/10

Why it matters

The article documents modeling work on dissolution processes relevant to deep-ultraviolet acid-hardened resists.

Sources

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