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Self-aligned double-patterning layout decomposition for two-dimensional random metals for sub-10-nm node design
SPIE journal article (published 2014-12-04) presenting a method for self-aligned double-patterning layout decomposition targeted at sub-10-nm semiconductor node design. The supplied record contains only the bibliographic metadata and title-level technical scope.
Categories: technology, science-and-space
Generated scores
Scores are based on the cited reporting and use a 1–10 scale. Read the methodology.
- Confidence
- 6/10
- Geographic reach
- 1/10
- Global importance
- 3/10
- Impact magnitude
- 3/10
- Positivity
- 6/10
- Urgency
- 1/10
Why it matters
Relates to layout and patterning techniques relevant to sub-10-nm semiconductor design.

