Planet Briefing

First published · Last updated

Self-aligned double-patterning layout decomposition for two-dimensional random metals for sub-10-nm node design

SPIE journal article (published 2014-12-04) presenting a method for self-aligned double-patterning layout decomposition targeted at sub-10-nm semiconductor node design. The supplied record contains only the bibliographic metadata and title-level technical scope.

Categories: technology, science-and-space

Generated scores

Scores are based on the cited reporting and use a 1–10 scale. Read the methodology.

Confidence
6/10
Geographic reach
1/10
Global importance
3/10
Impact magnitude
3/10
Positivity
6/10
Urgency
1/10

Why it matters

Relates to layout and patterning techniques relevant to sub-10-nm semiconductor design.

Sources

Report an issue