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Stochastic exposure kinetics of extreme ultraviolet photoresists: simulation study

Journal article titled "Stochastic exposure kinetics of extreme ultraviolet photoresists: simulation study" describing a simulation study of EUV photoresists. Published by SPIE on 2011-07-01; the supplied excerpt includes only publisher and content type and no further details.

Categories: science-and-space, technology

Generated scores

Scores are based on the cited reporting and use a 1–10 scale. Read the methodology.

Confidence
2/10
Geographic reach
1/10
Global importance
2/10
Impact magnitude
2/10
Positivity
5/10
Urgency
1/10

Why it matters

It reports a scientific simulation study relevant to extreme ultraviolet photoresist behavior.

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